UHV / STM

Ultra-high vacuum (UHV) two-chamber multi-sampler system from Omicron Nanotechnology for the preparation and detailed analysis of thin films and surface nanostructures

Main research methods

  • Scanning Probe Microscopy (SPM) for the measurement and imaging of a variety of surface properties with atomic resolution
  • Electron Spectroscopy for Chemical Analysis (ESCA) to determine the chemical composition of samples

General features

  • Two connected chambers: the first contains equipment for surface preparation and photoelectron spectroscopy, the second dedicated to scanning probe microscopy
  • Multi-stage pumping system to achieve pressures of 10-11 mbar in both chambers
  • Sluice chamber for rapid sample and SPM probe exchange
  • Omniax 5 degree-of-freedom manipulator with heating and cooling station for sample preparation and transfer, and ESCA measurements

Variable-temperature scanning microscope (VT SPM)

  • Scanning Tunneling Microscopy/Spectroscopy (STM/S) with the ability to handle currents below pA
  • Atomic Force Microscopy (AFM) based on the reflection of a laser beam from a scanning lever, for contact and non-contact measurements; different working modalities depending on the type of lever used (e.g. high-resolution AFM, Electrostatic Force Microscopy - EFM, Scanning Kelvin Probe Force Microscopy - SKPFM and Magnetic Force Microscopy - MFM)
  • Q-Plus sensor combining the advantages of AFM and STM
  • Matrix control system
  • Temperature control from 30 ÷ 500 K
  • STM in-situ blade preparation tool

Photoelectron Spectroscopy

  • SPHERA II hemispheric energy analyser
  • Di-anode X-ray source (DAR400) and monochromatic X-ray source (XM1000) for XPS (X-ray Photoelectron Spectroscopy) measurements
  • High-intensity vacuum UV source (HIS13) for UPS (Ultra-violet Photoelectron Spectroscopy) measurements
  • 0.1 ÷ 5 keV electron gun with 300 ?m spot size (EKF 300) for AES (Auger Electron Spectroscopy) measurements
  • CN10 electron gun for charge neutralisation

Preparation chamber

  • Single and triple electron beam evaporation source (EFM 3 & EFM 3T), organic diffusion cell (OME40) and low temperature diffusion cell (NTEZ) for clean deposition of different types of atoms and molecules; controlled deposition of sub-monoatomic layers and multilayers possible with Film Thickness Monitor (FTM)
  • Atomic hydrogen source (EFM-H) for passivation and atomic oxygen source (OBS40) for controlled oxidation of sample surfaces
  • Sputter source (ISE5) for sample cleaning, depth profiling (using ESCA) and controlled defect induction
  • Quadrupole mass analyser (Quad 300) for residual gas analysis (vacuum purity and infiltration search)