Oxidation kinetics of thin and ultra-thin Fe films

Rok publikacji: 2015
Wydawca:  Acta Physica Polonica A, 2015, 127, 549-551
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A. Marczyńska, J. Skoryna, M. Lewandowski, L. Smardz
We have studied oxidation kinetics of Fe thin films under atmospheric conditions using the fact that metallic iron is a ferromagnet but ultrathin natural iron oxides are practically nonmagnetic at room temperature. As a consequence, oxidation is associated with a loss in ferromagnetism. Fe thin films were deposited onto 1.5 nm V thick buffer layer using UHV magnetron sputtering. As a substrate we have used Si(100) wafers with an oxidised surface. Results show that all samples with an initial Fe thickness greater than 6 nm oxidize practically instantaneously, whereby a constant amount of 2.5 nm of metal is transformed into oxides. For iron thickness lower than 6 nm the time constant for oxidation increases considerably reaching a value of 30 days for the initial Fe thickness equal to 4 nm.

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