Influence of the negative R.F. bias voltage on the structural, mechanical and electrical properties of Hf-C-N coatings

Rok publikacji: 2015
Wydawca:  Accepted, Surface and Coating Technology, 12/2015; 286:251., (DOI: 10.1016/j.surfcoat.2015.12.050)
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W. F. Piedrahita, L. E. Coy, C. Amaya, I. Llarena, J. C. Caicedo, L. Yate
In this work Hf–C–N coatings were deposited on silicon substrates by reactive R.F. magnetron co-sputtering from two hafnium and carbon targets in a reactive nitrogen atmosphere at various negative bias voltages from 0 to 150 V. The effect of the bias voltage on the chemical composition, crystalline structure and mechanical properties was studied by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD) and nanoindentation. The results show that the obtained films have a Hf/(C + N) ratio of around 1 and present an evolution with the bias voltage from a quasi-amorphous structure, with a low hardness (6 GPa) to crystalline Hf 2 CN films with a high hardness (23 GPa) and electrical resistivity values in the order of 10 4 Ω·cm − 1 . This study shows the potential for hard and electrically conductive Hf–C–N films in industrial applications.

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